EN
It is a bionic friction-enhancing pad designed to fix and transfer wafers under medium & high vacuum, ambient temperature and high-temperature environments. It provides high tangential friction and normal adhesive force, improving the speed, efficiency and stability of wafer handling. It addresses the general interface control issues requiring high friction and strong adhesion in the semiconductor industry.
It is a core component for ODF vacuum bonding equipment for large-size wafers and glass substrates. It enables high-precision (≤0.2 μm) lamination of glass substrates under high vacuum conditions (< 0.3 Pa).
It is used for fixing products and correcting the flatness of plates, offering a convenient solution for securing daily items. It allows users to move and adjust the fixed positions of objects anytime with ease.
It greatly increases the friction coefficient of wall-climbing window cleaning robots on wet surfaces, effectively enhancing the adhesion force and working performance of the robot on water-containing surfaces.
Flexible printing plates dedicated to alignment film printing for liquid crystal panels
Our products are designed for repeated fixing and handling of smooth, fragile materials (glass, display panels, wafers, etc.) under medium-high vacuum and high-temperature environments across the general semiconductor industry. They resolve technical drawbacks such as surface scratches caused by mechanical clamping, adhesive residue left by chemical adhesives, and the inapplicability of conventional vacuum suction cups. Based on the Van der Waals force adhesion principle, we have developed a series of bionic adhesive pads. The bionic design of surface microstructures suppresses interfacial crack propagation and enhances adhesion stability. Meanwhile, the design supports release methods such as tangential rotation and air blow-off for wafer separation methods.
This bionic friction-increasing pad is designed for fixing and transferring wafers under medium & high vacuum, ambient temperature and high-temperature environments. It delivers high tangential friction force and extremely low normal adhesion force, improving the speed, efficiency and stability of wafer transportation. It addresses the universal interface control challenges featuring high friction and low adhesion within the semiconductor industry.